My research has arisen as a needed augmentation to running experiments
as part of a broader research goal aimed at the understanding and
modeling of Chemical Vapor Deposition (CVD). Directly, my focus is to
come up with the mechanistic model for this process. The primary tool
of
my work is a film growth simulation package known as FACET [1]. Our
goal
with FACET is to obtain grain size and roughness data from the
simulation as opposed to running time consuming deposition experiments.
I have spent much effort understanding the intricate workings of this
program to determine its application and usefulness towards our goals.I
also perform Atomic Force Microscopy (AFM) on deposited films in order
to find RMS roughness and grain size. These quantities are used to tie
my model to actual experiments.
1. Jie Zhang, James B. Adams,
"FACET: A Two Dimensional Simulator of
Polycrystalline Thin Film Growth," Arizona State University, 2000.
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updated on:
November 10, 2006
